Kure, Japan

Toshihiko Mishima


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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3 patents (USPTO):Explore Patents

Title: Innovations by Toshihiko Mishima

Introduction

Toshihiko Mishima is a notable inventor based in Kure, Japan. He has made significant contributions to the field of precision measurement tools, particularly through his work with Mitutoyo Corporation. With a total of 3 patents to his name, Mishima has developed innovative solutions that enhance the functionality and usability of micrometers.

Latest Patents

Mishima's latest patents include a micrometer and a method for manufacturing a cylindrical component for a micrometer. The method involves creating a thimble with graduations and numerals on its outer circumference through a double-color molding process. This technique utilizes two types of resin to achieve distinct colors, allowing for clear visibility of the graduations and numerals. The numerals are then marked onto the outer skin using laser technology. His micrometer design features a main body that holds an anvil and a spindle, with a lightweight frame constructed from bent metal plates. This design not only reduces weight but also enhances rigidity and minimizes heat transfer when held.

Career Highlights

Mishima's career at Mitutoyo Corporation has been marked by his dedication to innovation in measurement technology. His work has contributed to the advancement of precision tools that are essential in various industries, including manufacturing and engineering.

Collaborations

Mishima has collaborated with talented coworkers such as Hajime Sato and Kiyohiro Nakata, further enriching the innovative environment at Mitutoyo Corporation.

Conclusion

Toshihiko Mishima's contributions to the field of precision measurement through his patents and innovative designs have established him as a key figure in the industry. His work continues to influence the development of advanced measurement tools that meet the needs of modern applications.

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