Toshihiko Kitamura

Toshihiko Kitamura is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of solid-state imaging devices, holding a total of 3 patents. His work has advanced the technology used in various imaging applications.

Latest Patents

Kitamura's latest patents include innovative designs for solid-state imaging devices. One of his patents describes a solid-state imaging device that features a substrate with a region of a first conductivity type and a region of a second conductivity type. This design includes a multilayer wiring layer and a layer of the second conductivity type that is connected to the region of the second conductivity type. The concentration of impurities in this layer decreases as it moves away from the region of the second conductivity type.

Another patent focuses on a solid-state imaging device that incorporates a photo-receiving portion formed in the substrate. This device includes a wiring layer with a trench directly above the photo-receiving portion and a light guiding member made of organic material placed within the trench. The design allows for an empty space between the trench's side wall and the light guiding member, enhancing the device's functionality.

Career Highlights

Toshihiko Kitamura is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to explore and develop advanced imaging technologies that have applications in various fields.

Collaborations

Throughout his career, Kitamura has collaborated with notable colleagues, including Takashi Doi and Masaaki Ogawa. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Toshihiko Kitamura's contributions to solid-state imaging technology have made a significant impact in the field. His innovative patents and collaborations reflect his dedication to advancing imaging solutions.