Company Filing History:
Years Active: 2010-2011
Title: Innovations of Toshihiko Ishida
Introduction
Toshihiko Ishida is a notable inventor based in Ibaraki-ken, Japan. He has made significant contributions to the field of molecular beam technology, particularly in thin-film accumulation. With a total of 2 patents, his work has advanced the capabilities of molecular beam sources.
Latest Patents
Ishida's latest patents include a method for controlling the volume of a molecular beam. This innovative molecular beam source allows for the adjustment of the volume of a molecular beam discharged per hour using a needle valve. It ensures that the volume remains constant, regardless of the decrease in thin-film element-forming material within a crucible. The system incorporates heaters for heating the thin-film element-forming materials and valves for adjusting the volumes of the molecules generated within the crucibles. Additionally, it features a controller that adjusts the opening of the valves via servomotors, utilizing feedback from film-thickness meters to maintain optimal performance.
Career Highlights
Toshihiko Ishida is currently employed at Choshu Industry Co., Ltd., where he continues to innovate in the field of molecular beam technology. His work has been instrumental in enhancing the efficiency and reliability of thin-film deposition processes.
Collaborations
Ishida collaborates with Osamu Kobayashi, contributing to the development of advanced technologies in their field.
Conclusion
Toshihiko Ishida's contributions to molecular beam technology and thin-film accumulation demonstrate his commitment to innovation. His patents reflect a deep understanding of the complexities involved in this area, making him a valuable figure in the field.