Tokyo, Japan

Toshihiko Hosoya

This inventor holds 2 USPTO granted patents and 5 published patent applications and 1 EPO patent. Top assignees: Ricoh Company, Ltd., Elixirgen Scientific, Inc.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihiko Hosoya. Retrieved from https://idiyas.com/inventor/toshihiko-hosoya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Toshihiko Hosoya

Introduction

Toshihiko Hosoya is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of liquid droplet discharging technology. His work is particularly relevant in applications that require precision and stability in liquid dispensing.

Latest Patents

Toshihiko Hosoya holds a patent for a liquid droplet discharging apparatus. This innovative device is designed to maintain stable discharging even when a liquid containing particles or cells adheres to the nozzle surface. This advancement is crucial for various industrial and medical applications.

Career Highlights

Hosoya is currently employed at Ricoh Company, Ltd., where he continues to develop and refine technologies related to liquid dispensing. His expertise in this area has positioned him as a key figure in the company's research and development efforts.

Collaborations

Throughout his career, Toshihiko Hosoya has collaborated with talented individuals such as Yusuke Nonoyama and Takahiko Matsumoto. These partnerships have fostered innovation and have contributed to the success of their projects.

Conclusion

Toshihiko Hosoya's work in liquid droplet discharging technology exemplifies the impact of innovation in modern applications. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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