Toshihide Nakajima

Title: Toshihide Nakajima: Innovator in Substrate Polishing and Expansion Measurement

Introduction

Toshihide Nakajima is a notable inventor based in Akishima, Japan. He has made significant contributions to the field of substrate polishing and coefficient of linear expansion measurement. With a total of 2 patents, his work has advanced the technology used in various industrial applications.

Latest Patents

One of Nakajima's latest patents is for a substrate and a method for polishing a substrate. This invention focuses on achieving a substrate with a flatness of less than 230 nmPV and a surface roughness at RMS of less than 0.20 nm. The method involves polishing an object with a polishing pad that has at least one layer with a compressibility of 5% or below in its base layer.

Another significant patent is for a coefficient of linear expansion measuring apparatus and method. This apparatus includes two reflection plates that house a sample, a container filled with a gas of known refractive index variation, and a temperature regulating member. The device uses a light source to irradiate the reflection plates and a light receiving element to detect the intensity of reflected light. The calculating member then determines the coefficient of linear expansion of the sample by analyzing the optical path length variation.

Career Highlights

Throughout his career, Toshihide Nakajima has worked with reputable companies such as Ohara, Inc. and Kabushiki Kaisha Ohara. His experience in these organizations has contributed to his expertise in the field of innovation and invention.

Collaborations

Nakajima has collaborated with notable coworkers, including Kousuke Nakajima and Nobuo Kawasaki. Their joint efforts have likely fostered advancements in their respective fields.

Conclusion

Toshihide Nakajima's contributions to substrate polishing and expansion measurement demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in these areas.