The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2009
Filed:
Apr. 06, 2006
Applicants:
Kazuyoshi Nakamura, Sagamihara, JP;
Toshihide Nakajima, Akishima, JP;
Kousuke Nakajima, Sagamihara, JP;
Takahisa Oonami, Machida, JP;
Inventors:
Kazuyoshi Nakamura, Sagamihara, JP;
Toshihide Nakajima, Akishima, JP;
Kousuke Nakajima, Sagamihara, JP;
Takahisa Oonami, Machida, JP;
Assignee:
Ohara Inc., Sagamihara-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate having flatness of less than 230 nmPV and surface roughness at RMS of less than 0.20 nm. is obtained by a method comprising: a process of polishing an object to be polished with a polishing pad comprising at least one layer having compressibility of 5% or below in a base layer of the polishing pad.