This inventor holds 1 USPTO granted patent. Top assignee: Ohara, Inc.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: The Innovations of Takahisa Oonami
Introduction
Takahisa Oonami is a notable inventor based in Machida, Japan. He has made significant contributions to the field of substrate polishing technology. His work focuses on enhancing the flatness and surface quality of substrates used in various applications.
Latest Patents
Oonami holds a patent for a substrate and a method for polishing a substrate. This innovative method results in a substrate with a flatness of less than 230 nmPV and a surface roughness at RMS of less than 0.20 nm. The process involves polishing an object with a polishing pad that has at least one layer exhibiting compressibility of 5% or below in its base layer.
Career Highlights
Oonami is associated with Ohara, Inc., where he applies his expertise in substrate technology. His work has been instrumental in advancing the quality of substrates, which are critical in various high-tech industries.
Collaborations
He has collaborated with notable coworkers, including Kazuyoshi Nakamura and Toshihide Nakajima. Their combined efforts have contributed to the development of innovative solutions in substrate polishing.
Conclusion
Takahisa Oonami's contributions to substrate polishing technology highlight his role as an influential inventor in the field. His innovative methods and collaborations continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile