Toshiharu Watarai

Title: The Innovations of Toshiharu Watarai

Introduction

Toshiharu Watarai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science and engineering, particularly in the area of metallic film deposition. With a total of 8 patents to his name, Watarai continues to push the boundaries of innovation.

Latest Patents

One of Watarai's latest patents focuses on the "Reaction chamber passivation and selective deposition of metallic films." This invention allows for metallic layers to be selectively deposited on one surface of a substrate relative to a second surface. In various embodiments, the metallic layers are deposited on a first metallic surface compared to a second surface made of silicon. The reaction chamber used for this selective deposition can be passivated before the process, achieving selectivity rates of over 50% and even up to 90% in some cases.

Career Highlights

Watarai is currently employed at Asm IP Holding B.V., where he continues to develop innovative technologies. His work has been instrumental in advancing the techniques used in the deposition of metallic films, which are crucial for various applications in electronics and materials engineering.

Collaborations

Throughout his career, Watarai has collaborated with notable colleagues, including Dai Ishikawa and Shang Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Toshiharu Watarai's contributions to the field of metallic film deposition exemplify the spirit of innovation. His patents and collaborative efforts continue to influence advancements in materials science, making him a key figure in his industry.