Toshihara Eurakawa

Title: Toshihara Eurakawa: Innovator in Oxynitride Layer Technology

Introduction

Toshihara Eurakawa is a notable inventor based in Essex Junction, VT (US). He has made significant contributions to the field of materials science, particularly in the development of methods for forming oxynitride layers. His innovative approach has implications for various applications in semiconductor technology.

Latest Patents

Eurakawa holds a patent for a "Method and system for forming an oxynitride layer." This invention provides a method for preparing an oxynitride film on a substrate. The process involves exposing the substrate to oxygen radicals formed by ultraviolet (UV) radiation, which induces the dissociation of a first process gas containing oxygen. This results in the formation of an oxide film on the substrate's surface. Subsequently, the oxide film is treated with nitrogen radicals generated by plasma-induced dissociation of a second process gas containing nitrogen. This innovative technique allows for the nitridation of the oxide film, ultimately forming the desired oxynitride film.

Career Highlights

Throughout his career, Toshihara Eurakawa has worked with prominent companies in the technology sector. He has been associated with Tokyo Electron Limited and IBM, where he contributed to advancements in semiconductor manufacturing processes. His expertise in materials science has positioned him as a valuable asset in these organizations.

Collaborations

Eurakawa has collaborated with notable professionals in his field, including Masanobu Igeta and Cory Wajda. These collaborations have further enriched his work and contributed to the development of innovative technologies.

Conclusion

Toshihara Eurakawa's contributions to the field of oxynitride layer technology exemplify his innovative spirit and dedication to advancing materials science. His patent and career achievements reflect his significant impact on the industry.