Yamato, Japan

Toshifumi Asakawa

This inventor holds 18 USPTO granted patents, primarily in Semiconductor Technology. Top assignees: Megachips Corporation, Ricoh Company, Ltd., Neural Systems Corp.. Active years: 1981-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshifumi Asakawa. Retrieved from https://idiyas.com/inventor/toshifumi-asakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.8

ph-index = 11

Forward Citations = 644(Granted Patents)


Location History:

  • Chiyoda-Ku, Tokyo, JP (1997)
  • Yamato, JP (1981 - 2004)

Company Filing History:


Years Active: 1981-2004

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Areas of Expertise:
Semiconductor Device
Thin-Film Transistor
Single-Crystalline Film
Photovoltaic Device
Micromachine Manufacture
Gas Beam Crystallization
Electrical Contact
Optical Signal Processing
ROM Technology
Crystallization Method
Beam Irradiator
Electrical Contact Grooves
18 patents (USPTO):Explore Patents

Title: Toshifumi Asakawa: Innovator in Semiconductor Technology

Introduction

Toshifumi Asakawa is a prominent inventor based in Yamato, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 18 patents. His work focuses on the fabrication of micromachines and semiconductor devices, showcasing his expertise in materials science and engineering.

Latest Patents

Asakawa's latest patents include innovative methods for manufacturing micromachines and semiconductor devices. One notable patent describes a semiconductor device and method of fabricating the same. This invention allows for the easy and accurate manufacturing of micromachines made from single-crystalline materials with complex structures. The process involves irradiating the uppermost layer of a single-crystalline silicon substrate with Ne atom currents from multiple directions, converting the crystal orientation to achieve a desired configuration. A masking member is used to anisotropically etch the substrate, forming a V-shaped groove while the uppermost layer acts as an etching stopper. This method enables the production of micromachines with uniform thickness diaphragms.

Another significant patent focuses on a semiconductor device featuring a single crystal gate electrode and insulation. Similar to the previous invention, this method also utilizes Ne atom currents to manipulate the crystal orientation of the silicon substrate, facilitating the creation of complex micromachines without junctions.

Career Highlights

Throughout his career, Toshifumi Asakawa has worked with notable companies such as Megachips Corporation and Ricoh Company, Ltd. His experience in these organizations has contributed to his development as an inventor and innovator in the semiconductor industry.

Collaborations

Asakawa has collaborated with talented individuals in his field, including Masahiro Shindo and Daisuke Kosaka. These partnerships have likely enhanced his research and development efforts, leading to groundbreaking advancements in semiconductor technology.

Conclusion

Toshifumi Asakawa's contributions to semiconductor technology and micromachine fabrication have established him as a key figure in the industry. His innovative patents reflect his commitment to advancing technology and improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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