The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2004
Filed:
Jun. 12, 2000
Masahiro Shindo, Suita, JP;
Daisuke Kosaka, Suita, JP;
Tetsuo Hikawa, Suita, JP;
Akira Takata, Suita, JP;
Yukihiro Ukai, Suita, JP;
Takashi Sawada, Suita, JP;
Toshifumi Asakawa, Yamato, JP;
Other;
Abstract
In order to easily and accurately manufacture a micromachine comprising a member which is made of a single-crystalline material and having a complicated structure, an uppermost layer ( ) of a single-crystalline Si substrate ( ) whose (100) plane is upwardly directed is irradiated with Ne atom currents from a plurality of prescribed directions, so that the crystal orientation of the uppermost layer ( ) is converted to such orientation that the (111) plane is upwardly directed. A masking member ( ) is employed as a shielding member to anisotropically etch the substrate ( ) from its bottom surface, thereby forming a V-shaped groove ( ). At this time, the uppermost layer ( ) serves as an etching stopper. Thus, it is possible to easily manufacture a micromachine having a single-crystalline diaphragm having a uniform thickness. A micromachine having a complicated member such as a diagram which is made of a single-crystalline material can be easily manufactured through no junction.