This inventor holds 1 USPTO granted patent. Top assignee: Nikon Corporation. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: Toshichika Toma: Innovator in Photosensitive Substrate Technology
Introduction
Toshichika Toma is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of photosensitive substrates, particularly through his innovative patent. His work is recognized for enhancing the accuracy and efficiency of exposure methods in photolithography.
Latest Patents
Toma holds a patent for a method known as the Peripheral Edge Exposure Method. This invention involves exposing a photosensitive substrate using both a peripheral edge exposure apparatus and a pattern exposure apparatus. The peripheral edge exposure apparatus is designed to expose the peripheral portion of the substrate within a specified exposure width. Meanwhile, the pattern exposure apparatus transfers a scale pattern to the substrate, ensuring that the dimensions from the outer periphery are accurately known. The accuracy of the exposure width is evaluated by analyzing the resist image of the scale pattern that appears on the substrate after development. This innovative approach has the potential to improve the precision of photolithographic processes.
Career Highlights
Toshichika Toma is associated with Nikon Corporation, a leading company in imaging and optical products. His role at Nikon has allowed him to work on cutting-edge technologies that advance the field of photolithography. His contributions have been instrumental in developing methods that enhance the performance of imaging systems.
Collaborations
Throughout his career, Toma has collaborated with esteemed colleagues such as Shouji Tanaka and Masao Nakajima. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.
Conclusion
Toshichika Toma's work in the development of the Peripheral Edge Exposure Method exemplifies his commitment to innovation in the field of photolithography. His contributions continue to influence the industry, showcasing the importance of precision in imaging technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile