The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1998
Filed:
Aug. 01, 1996
Applicant:
Inventors:
Shouji Tanaka, Kanagawa-ken, JP;
Masao Nakajima, Kanagawa-ken, JP;
Toshichika Toma, Kanagawa-ken, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430 30 ; 430311 ; 430322 ; 430327 ; 382145 ;
Abstract
A photosensitive substrate is exposed with both a peripheral edge exposure apparatus which exposes the peripheral portion of the photosensitive substrate in a specified exposure width and a pattern exposure apparatus which transfers a scale pattern to the photosensitive substrate so that a dimension from the outer periphery of the photosensitive substrate is known. The accuracy (offset quantity) of the exposure width of the peripheral edge exposure apparatus is evaluated by reading out the resist image of the scale pattern which appears on the substrate after development.