Miyagi, Japan

Toshiaki Saijo

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaki Saijo. Retrieved from https://idiyas.com/inventor/toshiaki-saijo-hneqbc4m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Toshiaki Saijo: Innovator in Plasma Processing Technology

Introduction

Toshiaki Saijo is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus and method.

Latest Patents

Toshiaki Saijo holds 1 patent for his invention titled "Plasma processing apparatus and plasma processing method." This patent describes a plasma processing apparatus where a controller specifies a time point for current flow between an edge ring and a DC power supply. The controller also estimates the self-bias voltage of the edge ring based on voltage measurements, ensuring optimal performance during plasma processing.

Career Highlights

Toshiaki Saijo is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in advancing plasma processing technologies, which are crucial for various applications in electronics.

Collaborations

Some of Toshiaki Saijo's notable coworkers include Jun Abe and Shogo Shoji. Their collaborative efforts contribute to the innovative environment at Tokyo Electron Limited.

Conclusion

Toshiaki Saijo's contributions to plasma processing technology exemplify the spirit of innovation in the field. His patent and work at Tokyo Electron Limited highlight the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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