Company Filing History:
Years Active: 2011-2015
Title: Toshiaki Oi: Innovator in Polishing Compositions
Introduction
Toshiaki Oi is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of polishing compositions, particularly for silicon wafers and glass substrates. With a total of 2 patents, Oi's work is recognized for its innovative approaches to material processing.
Latest Patents
Oi's latest patents include a polishing composition for silicon wafers and a polishing composition for glass substrates. The polishing composition for silicon wafers consists of a macromolecular compound, an abrasive, and an aqueous medium. This composition features specific constitutional units that enhance its effectiveness. The polishing composition for glass substrates is designed to have a pH ranging from 1 to 5 and contains silica particles of varying sizes. This invention is particularly useful in the manufacturing of glass hard disks and other advanced glass products.
Career Highlights
Toshiaki Oi is currently employed at Kao Corporation, where he continues to develop innovative solutions in the field of polishing compositions. His work has contributed to advancements in various industries, including electronics and materials science.
Collaborations
Oi has collaborated with notable coworkers such as Kazuhiko Nishimoto and Masahiko Suzuki. Their combined expertise has furthered the development of effective polishing solutions.
Conclusion
Toshiaki Oi's contributions to polishing compositions demonstrate his commitment to innovation and excellence in material processing. His patents reflect a deep understanding of the complexities involved in creating effective polishing solutions.