This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: Toshiaki Ohno: Innovator in Thermosensitive Technology
Introduction
Toshiaki Ohno, a prominent inventor based in Suzuka, Japan, has made significant contributions to the field of thermosensitive technology. With a focus on enhancing the efficiency of production processes, Ohno has developed patented innovations that offer unique solutions in various applications.
Latest Patents
Ohno is credited with a patent for a "High-sensitivity thermosensitive multilayer film and method for producing plate-making paper using the film." This invention pertains to a specialized multilayer film that comprises at least one functional layer and one peeling layer. The functional layer features a thermoplastic resin layer that demonstrates a notable thermal shrinkage rate and stress value, optimizing its performance in manufacturing stencil sheets.
Career Highlights
Currently, Toshiaki Ohno is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a well-regarded company known for its advancements in chemical products. His work revolves around improving operational efficiencies during the lamination process and enhancing the resistance of original paper to curling, especially under high-temperature conditions.
Collaborations
Throughout his career, Ohno has collaborated with esteemed colleagues, including Isao Yoshimura and Hideo Hata. Together, they have worked on innovative projects that push the boundaries of what is possible in thermosensitive technology.
Conclusion
Toshiaki Ohno’s inventive spirit and dedication to the field of thermosensitivity exemplify the vital role of inventors in advancing technology. His patented work not only improves manufacturing processes but also sets the stage for further innovations within the industry. As trends in technology continue to evolve, Ohno's contributions will undoubtedly play a crucial role in shaping future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
