Numazu, Japan

Toshiaki Katahira

This inventor holds 2 USPTO granted patents. Top assignees: Shibaura Machine Co., Ltd., Toshiba Kikai Kabushiki Kaisha. Active years: 1997-2026.


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1997-2026

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2 patents (USPTO):Explore Patents

Title: Toshiaki Katahira: Innovator in Layer Thickness Measurement

Introduction

Toshiaki Katahira is a notable inventor based in Numazu, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of layer thickness measurement. His innovative approach has led to the development of a unique method that enhances the accuracy of measuring coated layers.

Latest Patents

Katahira holds a patent for a "Method and apparatus for measuring the thickness of layers coated on." This patent describes a method for measuring the thicknesses of each layer coated on both surfaces of a base material. The process involves measuring distances using displacement meters and calculating the thickness of the layers with precision. His invention simplifies the measurement process and improves the reliability of the results.

Career Highlights

Toshiaki Katahira is associated with Toshiba Kikai Kabushiki Kaisha, a company known for its advancements in technology and engineering. His work at Toshiba has allowed him to focus on innovative solutions that address real-world challenges in measurement techniques. With a patent portfolio that includes 1 patent, Katahira continues to push the boundaries of what is possible in his field.

Collaborations

Katahira has collaborated with Satoru Nitta, a fellow innovator, to further enhance the development of measurement technologies. Their partnership exemplifies the spirit of teamwork in the pursuit of innovation.

Conclusion

Toshiaki Katahira's contributions to layer thickness measurement demonstrate his commitment to innovation and excellence. His patented method not only advances measurement technology but also sets a standard for future developments in the field.

Profile summary based on public USPTO records.
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