Chigasaki, Japan

Toru Kimura

This inventor holds 1 USPTO granted patent. Top assignee: Ulvac, Inc.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Kimura. Retrieved from https://idiyas.com/inventor/toru-kimura-ma8x1sye

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovations of Toru Kimura

Introduction

Toru Kimura is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of thin film technology. His work focuses on enhancing the accuracy of film thickness measurements, which is crucial in various industrial applications.

Latest Patents

Toru Kimura holds a patent for a "Thin film forming apparatus, film thickness measuring method and film thickness sensor." This innovative technology allows for accurate measurement of film thickness, even in cases where exfoliation occurs. The method involves calculating a difference frequency from the resonance frequency of a film thickness sensor at different times. By detecting exfoliation and adjusting the film thickness value accordingly, the technology ensures precise measurements, which are essential for quality control in film formation processes.

Career Highlights

Toru Kimura is currently employed at Ulvac, Inc., a company known for its advanced vacuum technology and thin film deposition systems. His expertise in film thickness measurement has positioned him as a key figure in the development of innovative solutions in this field.

Collaborations

Toru Kimura collaborates with Masato Fukao, a fellow innovator in the industry. Their combined efforts contribute to the advancement of technologies that enhance the performance and reliability of thin film applications.

Conclusion

Toru Kimura's contributions to thin film technology exemplify the importance of innovation in achieving precision in industrial processes. His patent reflects a significant advancement in the field, ensuring that accurate measurements can be obtained even under challenging conditions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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