Nirasaki, Japan

Toru Kanazawa

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Kanazawa. Retrieved from https://idiyas.com/inventor/toru-kanazawa-m2xcr6lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Toru Kanazawa: Innovator in Film-Forming Technology

Introduction

Toru Kanazawa is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of film-forming technology, particularly through his innovative methods and apparatus.

Latest Patents

Kanazawa holds a patent for a film-forming method and film-forming apparatus. This method involves forming a first film by performing an operation that includes supplying a first raw material gas containing a first element to a substrate and causing it to be adsorbed. Additionally, it includes supplying a first reaction gas to the substrate. The process also entails forming a second film on the substrate by supplying a second raw material gas containing a second element and a second reaction gas. This results in a mixed film formed through these operations.

Career Highlights

Toru Kanazawa is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work has been instrumental in advancing film-forming technologies that are crucial for various applications in electronics.

Collaborations

Kanazawa has collaborated with notable colleagues such as Tatsuhiko Tanimura and Toshiyuki Ikeuchi. Their combined expertise has contributed to the development of innovative solutions in the field.

Conclusion

Toru Kanazawa's contributions to film-forming technology exemplify the impact of innovation in the electronics industry. His patent and collaborative efforts highlight the importance of continuous advancement in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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