Sayama, Japan

Toru Ishitani

This inventor holds 2 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1986-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Ishitani. Retrieved from https://idiyas.com/inventor/toru-ishitani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Sayama, JP (1986)
  • Saitama, JP (1987)

Company Filing History:


Years Active: 1986-1987

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2 patents (USPTO):Explore Patents

Title: The Innovations of Toru Ishitani

Introduction

Toru Ishitani is a notable inventor based in Sayama, Japan. He has made significant contributions to the field of ion beam technology, holding a total of 2 patents. His work primarily focuses on the processing and analysis of semiconductor materials.

Latest Patents

Ishitani's latest patents include an innovative ion beam apparatus. This apparatus allows for the surface of a specimen, such as a semiconductor wafer, to be processed and analyzed by irradiating it with an ion beam. The specific zone of the specimen is maintained at a temperature higher than the melting point of the element or compound forming the ion species used for irradiation. Various heating means can be employed, including an electron beam source, a light source, a resistance heating source, or a high-frequency heating source. Another significant patent is for an ion source, which features a crucible designed to hold ion source material. This crucible has an aperture in its bottom wall, and an emitter chip is positioned within it in a coaxial manner. The design ensures that the edge of the emitter chip passes through the aperture, enhancing the efficiency of ion extraction.

Career Highlights

Toru Ishitani is currently employed at Hitachi, Ltd., where he continues to develop advanced technologies in the field of ion beam applications. His work has been instrumental in improving the precision and effectiveness of semiconductor processing techniques.

Collaborations

Ishitani has collaborated with several esteemed colleagues, including Hifumi Tamura and Shigehiko Yamamoto. Their combined expertise has contributed to the advancement of ion beam technology and its applications in various industries.

Conclusion

Toru Ishitani's contributions to ion beam technology and semiconductor processing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the field. His work continues to influence the development of new technologies in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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