Tokyo, Japan

Toru Ikegami

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toru Ikegami. Retrieved from https://idiyas.com/inventor/toru-ikegami-et1jpmuk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Toru Ikegami: Innovator in Pattern Dimension Measurement

Introduction

Toru Ikegami is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of pattern dimension measurement methods. His work is essential for advancing the accuracy of measurements in various applications.

Latest Patents

Toru Ikegami holds a patent for a "Pattern dimension measurement method and charged particle beam apparatus." This invention aims to provide a method for accurately measuring the amount of shrinkage of a pattern and its original dimension value before shrinkage. The method involves forming a thin film on a sample after beam scanning, acquiring measurement values, and calculating the amount of shrinkage through subtraction processing.

Career Highlights

Ikegami is associated with Hitachi High-Technologies Corporation, where he applies his expertise in measurement technology. His innovative approach has led to advancements in the field, enhancing the capabilities of charged particle beam apparatuses.

Collaborations

He has collaborated with notable colleagues, including Hiroki Kawada and Norio Hasegawa, contributing to the development of cutting-edge technologies in their field.

Conclusion

Toru Ikegami's contributions to pattern dimension measurement methods exemplify the importance of innovation in technology. His work continues to influence advancements in measurement accuracy and efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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