Toru Furushige

Title: Toru Furushige: Patents in Wafer Processing and Polishing

Introduction

Toru Furushige is an inventor based in Osaka, Japan. His patent work includes technologies for polishing film-based substrates and separating wafers from a slicing base. He is associated with Panasonic Intellectual Property Management Co., Ltd. His record includes 2 patents.

Latest Patents

Furushige’s listed patents address processes and equipment used in semiconductor and materials manufacturing.

“Polishing apparatus and polishing method” describes equipment for polishing a target object formed on a film-shaped substrate. The apparatus uses a rotatable polishing tool, a slurry nozzle that supplies polishing slurry, and a polishing stage that presses the tool against the target object. The stage has an uneven surface shape.

“Wafer separating apparatus and wafer separating method” concerns separating wafers bonded to a slicing base with adhesive. The apparatus includes a water tank, a retainer for holding the slicing base, a nozzle that directs a water jet toward a wafer’s side, and a tray inside the tank to collect separated wafers.

Career Highlights

Furushige’s patent portfolio reflects work on practical manufacturing equipment, with a focus on polishing and wafer handling. Both inventions describe apparatuses designed to support specific processing steps.

Collaborations

Furushige’s listed coworkers include Yuji Yamamoto and Michirou Yoshino. His company affiliation is Panasonic Intellectual Property Management Co., Ltd.

Conclusion

Toru Furushige’s two listed patents focus on polishing substrates and separating wafers, highlighting his contributions to manufacturing-process equipment.