Torbjörn Ling

Title: Torbjörn Ling: Innovator in Nano Imprinting Technology

Introduction

Torbjörn Ling is a notable inventor based in Lund, Sweden. He has made significant contributions to the field of nano imprinting technology, holding a total of three patents. His work focuses on developing advanced methods and tools for creating nanoscale patterns, which have applications in various industries.

Latest Patents

Torbjörn Ling's latest patents include a mold for nano imprinting and a method for manufacturing a mold tool. This innovative mold is designed for forming a structured nanoscale pattern on an object, featuring an anti-adhesive layer that enhances its functionality. Additionally, he has developed a stamp for transferring nanoscale patterns, which incorporates a monomolecular antisticking layer. This layer is composed of molecular chains that are covalently bound to the stamp's surface, ensuring effective pattern transfer while maintaining the integrity of the stamp.

Career Highlights

Throughout his career, Torbjörn Ling has worked with companies such as Obducat AB and Obducat Aktiebolag. His experience in these organizations has allowed him to refine his expertise in nano imprinting and contribute to the advancement of related technologies.

Collaborations

Torbjörn has collaborated with notable colleagues, including Lars Montelius and Babak Heidari. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Torbjörn Ling's work in nano imprinting technology exemplifies his commitment to innovation and excellence. His patents and collaborations reflect his significant impact on the field, paving the way for future advancements in nanoscale manufacturing.