Company Filing History:
Years Active: 2003-2006
Title: The Innovative Contributions of Tony Luong
Introduction
Tony Luong is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of chemical mechanical planarization (CMP) technology. With a total of 6 patents to his name, Luong continues to push the boundaries of innovation in his industry.
Latest Patents
Among his latest patents is the "Air platen for leading edge and trailing edge control." This invention describes an air platen assembly that includes a platen with a plurality of concentric rings. Each ring features multiple openings to provide a cushion of air to a CMP belt. Notably, at least one of the rings extends beyond the outer edge of a wafer to be planarized by the CMP belt. Additionally, a support is attached to the platen, equipped with air ports for pressurized air to pass to the rings. A gasket is positioned between the support and the platen, featuring cutouts that align with the openings and air ports. A base is also included to support the assembly.
Another significant patent is the "Method and apparatus for heating polishing pad." This temperature controlling system is designed for use in a CMP system with a linear polishing belt. It includes a platen with multiple zones and a temperature sensor to determine the temperature of the linear polishing belt. The system also features a controller that adjusts the flow of temperature-conditioned fluid to selected zones based on the sensor's output.
Career Highlights
Tony Luong is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on enhancing CMP processes, which are critical for the manufacturing of integrated circuits. Luong's innovative solutions have contributed to the efficiency and effectiveness of semiconductor fabrication.
Collaborations
Throughout his career, Luong has collaborated with talented individuals such as Xuyen Pham and David Wei. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Tony Luong's contributions to the field of CMP technology exemplify his dedication to innovation. His patents reflect a commitment to improving semiconductor manufacturing processes. As he continues to work at Lam Research Corporation, Luong's impact on the industry is sure to grow.