Tianjin, China

Tongqing Wang


Average Co-Inventor Count = 6.9

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Beijing, CN (2015)
  • Tianjin, CN (2020)

Company Filing History:


Years Active: 2015-2024

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3 patents (USPTO):

Title: Innovations by Inventor Tongqing Wang

Introduction

Tongqing Wang is a notable inventor based in Tianjin, China, with a strong focus on innovations in the field of chemical mechanical polishing. With three patents to his name, his contributions significantly enhance the efficiency and effectiveness of polishing processes used in various industries.

Latest Patents

Tongqing Wang's latest inventions revolve around improving chemical mechanical polishing methods and devices. His key patents include a comprehensive monitoring method for chemical mechanical polishing and a sophisticated apparatus designed specifically for this purpose. The monitoring method involves a detailed process of loading a wafer and conditioning the polishing pad, utilizing a conditioner with a drive arm that collects strain data to indicate the wear state of the polishing pad. The apparatus itself features multiple polishing sections with advanced mechanisms for efficient operations, ensuring that the polishing head can seamlessly transition between positions while maintaining high precision.

Career Highlights

Throughout his career, Tongqing Wang has made significant contributions while affiliated with reputable organizations. He has worked with Hwatsing Technology Co., Ltd., where he applied his expertise in research and development. Additionally, his tenure at Tsinghua University, one of China's leading institutions, further showcased his commitment to advancing technology in polishing processes.

Collaborations

Tongqing Wang has collaborated with esteemed colleagues such as Xinchun Lu and Zhenjie Xu. This teamwork has not only fostered the development of innovative technologies but also highlighted the importance of collaboration in achieving breakthroughs in research and engineering fields.

Conclusion

With his extensive background and innovative patents, Tongqing Wang continues to contribute to advancements in chemical mechanical polishing. His work not only paves the way for improved manufacturing processes but also emphasizes the vital role of inventors in driving technological progress.

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