Company Filing History:
Years Active: 2016-2019
Title: Innovations of Inventor Tong Lei
Introduction
Tong Lei is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication processes of advanced electronic devices. With a total of four patents to his name, his work is recognized for its innovative approaches to improving manufacturing techniques.
Latest Patents
Tong Lei's latest patents include a method for fabricating metal gates. This method involves forming special layers instead of the traditional TiN hard mask over the ILD0 layer. This innovation aims to minimize ILD0 losses during the conventional ILD0 CMP process. The process includes forming a first thin ashable film layer over the ILD0 layer, followed by a second thin dielectric layer. During the aluminum CMP process, the second layer is polished away, allowing for a reduction in ILD0 loss and improving the overall height of the initial dummy gate.
Another notable patent focuses on the integration process of finFET spacer formation. This novel plasma process enhances the conventional methods used in spacer formation for FinFET devices. By growing an oxide layer over sidewall materials and utilizing low energy plasma gas for over-etching, this technique effectively protects the sidewall materials and reduces CD losses. This improvement not only safeguards the fin structure but also minimizes silicon losses compared to traditional high energy plasma processes.
Career Highlights
Tong Lei is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to develop innovative solutions in semiconductor manufacturing. His expertise in fabrication technology has positioned him as a key player in the industry.
Collaborations
Tong Lei has collaborated with notable colleagues, including Yongyue Chen and Jingxun Fang. Their combined efforts contribute to the advancement of semiconductor technologies and the development of new manufacturing processes.
Conclusion
In summary, Tong Lei is an influential inventor whose work in semiconductor fabrication has led to significant advancements in the industry. His innovative patents reflect a commitment to improving manufacturing processes and enhancing device performance.