Tomoyuki Toda

Title: Tomoyuki Toda: Innovator in Chemical Mechanical Polishing

Introduction

Tomoyuki Toda is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of chemical mechanical polishing, particularly in the polishing of silicon wafers. His innovative approach has led to the development of a unique polishing composition that enhances the efficiency and effectiveness of the polishing process.

Latest Patents

Tomoyuki Toda holds 1 patent for his invention titled "Chemical mechanical polishing composition for polishing silicon wafers and related methods." This patent describes a chemical mechanical polishing composition that includes water, an optional abrasive, a cation, piperazine or a piperazine derivative, and a quaternary ammonium compound. The composition is designed to exhibit a pH of 9 to 12, making it suitable for the delicate process of polishing silicon wafers. Additionally, the patent outlines methods for making and using this innovative composition.

Career Highlights

Throughout his career, Tomoyuki Toda has worked with prominent companies in the electronic materials sector. Notably, he has been associated with Rohm and Haas Electronic Materials CMP Holdings, Inc. and Nitta Haas Inc. His experience in these organizations has allowed him to refine his expertise in chemical mechanical polishing and contribute to advancements in the industry.

Collaborations

Tomoyuki has collaborated with esteemed colleagues such as Yasuyuki Itai and Naresh Kumar Penta. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of chemical mechanical polishing.

Conclusion

Tomoyuki Toda's contributions to the field of chemical mechanical polishing have established him as a key figure in the industry. His innovative patent and collaborative efforts with other professionals highlight his commitment to advancing technology in silicon wafer polishing.