Kyoto, Japan

Tomoyuki Shibagaki


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Tomoyuki Shibagaki: Innovator in Photosensitive Resin Technology

Introduction

Tomoyuki Shibagaki is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His innovative work has led to the creation of a patented technology that enhances pattern formation methods.

Latest Patents

Shibagaki holds a patent for a negative photosensitive resin composition, which includes an epoxy group-containing resin and a cationic polymerization initiator. This initiator features a sulfonium salt represented by a specific general formula. The composition is designed to improve the efficiency and effectiveness of pattern formation in various applications.

Career Highlights

Throughout his career, Tomoyuki Shibagaki has worked with prominent companies such as San-apro Limited and Tokyo Ohka Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to advancements in the field.

Collaborations

Shibagaki has collaborated with talented individuals, including Takuto Nakao and Yuji Nakamura. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Tomoyuki Shibagaki's contributions to the field of photosensitive resin technology exemplify his dedication to innovation. His patented work continues to influence advancements in materials science and pattern formation methods.

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