Location History:
- Kanagawa, JP (1991 - 1992)
- Kawasaki, JP (1993 - 1996)
Company Filing History:
Years Active: 1991-1996
Title: Tomotoshi Inoue: Innovator in Integrated Circuit Technology
Introduction
Tomotoshi Inoue is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of integrated circuits, holding a total of 4 patents. His work focuses on innovative methods for forming wirings and semiconductor devices, showcasing his expertise and dedication to advancing technology.
Latest Patents
Inoue's latest patents include a method of forming wirings for integrated circuits by electroplating. This method involves several steps, including forming wirings on a substrate, coating them with a thin under metal layer, and utilizing a mask for selective etching. The process culminates in the deposition of a plating metal layer, ensuring high-quality wiring formation. Another notable patent is for a metal semiconductor device, which features a Schottky junction formed between an electrode and a semiconductor substrate. This device includes an oxidized conductor layer and a unique production method that enhances its performance.
Career Highlights
Tomotoshi Inoue is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to contribute to cutting-edge developments in semiconductor technology. Inoue's patents reflect his commitment to improving the efficiency and effectiveness of integrated circuits.
Collaborations
Inoue has collaborated with notable colleagues, including Kenichi Tomita and Toshiyuki Terada. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Tomotoshi Inoue's contributions to integrated circuit technology and semiconductor devices highlight his role as a key innovator in the field. His patents and collaborations demonstrate his commitment to advancing technology and improving electronic components.