This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignees: Hayashi Pure Chemical Ind., Ltd., Sanyo Electric Co., Ltd., Sanyo Semiconductor Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Tomotake Matsuda: Innovator in Etching Liquid Composition
Introduction
Tomotake Matsuda is a notable inventor hailing from Taki-gun, Japan. He has made significant contributions to the field of etching technology, particularly through his innovative patent related to etching liquid compositions. His work has implications for the manufacturing of metal films, enhancing the quality and precision of the etching process.
Latest Patents
Matsuda holds a patent for an etching liquid composition that effectively etches metal films, such as aluminum and aluminum alloys. This composition is designed to provide good controllability during the etching process, preventing resist bleeding and ensuring a proper taper configuration with superior flatness. The etching liquid consists of a water solution containing phosphoric acid, nitric acid, and an organic acid salt. The organic acid salt is selected from various groups, including aliphatic and aromatic carboxylic acids, and the concentration of the organic acid salt ranges from 0.1% to 20% by weight.
Career Highlights
Throughout his career, Matsuda has worked with prominent companies, including Hayashi Pure Chemical Industry, Ltd. and Sanyo Electric Co., Ltd. His experience in these organizations has contributed to his expertise in the field of chemical engineering and etching technologies.
Collaborations
Matsuda has collaborated with notable colleagues such as Tsuguhiro Tago and Mayumi Kimura. Their joint efforts have likely played a role in advancing the research and development of innovative etching solutions.
Conclusion
Tomotake Matsuda's contributions to the field of etching liquid compositions demonstrate his innovative spirit and commitment to enhancing manufacturing processes. His patent reflects a significant advancement in the technology used for etching metal films, showcasing the importance of research and collaboration in driving innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile