Chiba, Japan

Tomotaka Yamanaka


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2002-2010

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2 patents (USPTO):Explore Patents

Title: Innovator Tomotaka Yamanaka: Pioneering Photosensitive Resins and Compositions

Introduction

Tomotaka Yamanaka, an accomplished inventor based in Chiba, Japan, has made significant contributions to the field of photosensitive materials. With a total of two patents to his name, Yamanaka has focused on creating innovative solutions that enhance the functionality and quality of photosensitive resins and compositions used in various applications.

Latest Patents

Yamanaka’s latest patents include a photosensitive resin and a photosensitive composition. The photosensitive resin he developed enables the formation of high-quality patterns without compromising compatibility between the acid generator and the photoresist’s primary-component polymer. This advancement is crucial for improving the effectiveness of photolithography processes. The resin includes a unique repeating unit characterized by specific hydrocarbon structures. Additionally, he has developed a method for producing a high-purity 1,2-naphthoquinonediazide photosensitive agent. This innovative method minimizes impurities by utilizing specific organic solvents and processes, ensuring superior quality in photosensitive applications.

Career Highlights

Throughout his career, Tomotaka Yamanaka has collaborated with reputable companies, including Toyo Gosei Kogyo Co., Ltd. and Hyogo Prefecture. His work in these organizations has further solidified his reputation as a leading inventor in the area of photosensitive materials.

Collaborations

Yamanaka has also worked alongside notable coworkers such as Masamichi Hayakawa and Takeo Watanabe. Together, they have explored new possibilities in the realm of photosensitive compounds, pushing the boundaries of innovation in this field.

Conclusion

Tomotaka Yamanaka’s contributions to the development of photosensitive resins and compositions illustrate the importance of innovation in enhancing technological applications. His patents pave the way for advancements in photolithography and related areas, marking him as a key figure in the industry. As innovation continues to evolve, the impact of Yamanaka's work will likely be felt for years to come.

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