The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
May. 08, 2001
Applicant:
Inventors:
Tomotaka Yamanaka, Chiba, JP;
Masamichi Hayakawa, Chiba, JP;
Assignee:
Toyo Gosei Kogyo Co., Ltd., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; G03F 7/022 ;
U.S. Cl.
CPC ...
C07C / ; G03F 7/022 ;
Abstract
A method for producing a high-purity 1,2-naphthoquinonediazide photosensitive agent containing a low level of impurities, by condensing, in an organic solvent other than amide, polyhydric phenolic compound and 1,2-naphthoquinonediazide-sulfonic acid halide in the presence of organic amine; subsequently adding amide solvent to the resultant reaction mixture; and separating the resulting organic amine acid salt through filtration.
Yamanaka, Tomotaka. (2002). Method for producing 1,2-naphthoquinonediazide photosensitive agent (U.S. Patent No. 6448383). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6448383
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile