The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Nov. 30, 2007
Takeo Watanabe, Hyogo, JP;
Hiroo Kinoshita, Hyogo, JP;
Shinichi Yusa, Hyogo, JP;
Tomotaka Yamanaka, Chiba, JP;
Masamichi Hayakawa, Chiba, JP;
Yosuke Osawa, Chiba, JP;
Satoshi Ogi, Chiba, JP;
Yoshitaka Komuro, Kanagawa, JP;
Takeo Watanabe, Hyogo, JP;
Hiroo Kinoshita, Hyogo, JP;
Shinichi Yusa, Hyogo, JP;
Tomotaka Yamanaka, Chiba, JP;
Masamichi Hayakawa, Chiba, JP;
Yosuke Osawa, Chiba, JP;
Satoshi Ogi, Chiba, JP;
Yoshitaka Komuro, Kanagawa, JP;
Hyogo Prefecture, Hyogo, JP;
Toyo Gosei Co., Ltd, Chiba, JP;
Abstract
A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein Rrepresents a C2-C9 linear or branched divalent hydrocarbon group; each of Rto Rrepresents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of Rand Rrepresents an organic group, wherein Rand Rmay together form a divalent organic group; and Xrepresents an anion); (wherein Rrepresents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula ():