This inventor holds 1 USPTO granted patent. Top assignees: Hyogo Prefecture, Toyo Gosei Co., Ltd.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 6 
1 out of 49 
Years Active: 2010
Title: Satoshi Ogi: Innovator in Photosensitive Resin Technology
Introduction
Satoshi Ogi is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of photosensitive materials, particularly through his innovative patent related to photosensitive resin and composition.
Latest Patents
Ogi holds a patent for a photosensitive resin that enables the formation of patterns with excellent shape fidelity. This invention avoids compatibility issues between an acid generator and a photoresist primary-component polymer that contains an acid-dissociable group. The photosensitive composition includes a repeating unit represented by a specific formula, which incorporates a C2-C9 linear or branched divalent hydrocarbon group.
Career Highlights
Throughout his career, Satoshi Ogi has worked with various organizations, including Hyogo Prefecture and Toyo Gosei Co., Ltd. His work has been instrumental in advancing the technology surrounding photosensitive materials.
Collaborations
Ogi has collaborated with notable colleagues such as Takeo Watanabe and Hiroo Kinoshita, contributing to the development of innovative solutions in his field.
Conclusion
Satoshi Ogi's contributions to the field of photosensitive resin technology highlight his role as an influential inventor. His work continues to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile