Location History:
- Kofu, JP (2000)
- Fukuyama, JP (2001)
- Himeji, JP (2002)
Company Filing History:
Years Active: 2000-2002
Title: Innovations of Tomomi Kondo
Introduction
Tomomi Kondo is a notable inventor based in Himeji, Japan. She has made significant contributions to the field of semiconductor processing, holding three patents that showcase her innovative spirit and technical expertise.
Latest Patents
One of her latest patents is a process device designed for substrate processing. This device incorporates a dipole ring magnet (DRM) that minimizes leakage magnetic fields in the vicinity of the process device. The DRM rotates around the outer periphery of a process chamber, which houses a plasma generation device. A shield plate covers the outer periphery of the DRM and rotates in the opposite direction, generating a magnetic field that cancels out leakage magnetic flux.
Another significant patent is the magnetron plasma processing apparatus. This apparatus features a vacuum chamber that accommodates a semiconductor wafer. Within the chamber, a pair of electrodes face each other, with the wafer placed on one electrode. A vertical electric field is established between the electrodes, while a horizontal magnetic field is created by the DRM, crossing perpendicularly to the electric field. The magnetic field is designed to have a gradient in intensity, ensuring uniformity over a large area, including the wafer's end portion.
Career Highlights
Tomomi Kondo has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Shin-Etsu Chemical Co., Ltd. Her experience in these organizations has allowed her to develop and refine her innovative ideas, contributing to advancements in semiconductor technology.
Collaborations
Throughout her career, Kondo has collaborated with esteemed colleagues, including Junichi Arami and Hiroo Ono. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Tomomi Kondo's contributions to the field of semiconductor processing through her innovative patents and collaborations highlight her as a significant figure in the industry. Her work continues to influence advancements in technology and processing methods.