Company Filing History:
Years Active: 2020
Title: Innovator Tomomasa Ishida: Pioneering Substrate Processing Technology
Introduction: Tomomasa Ishida, a prominent inventor based in Kyoto, Japan, has made significant contributions to the field of substrate processing. With one patent to his name, his work revolves around enhancing the efficiency of substrate processing methods in various industrial applications.
Latest Patents: Ishida holds a patent for a substrate processing apparatus and method that introduces a low-surface-tension liquid supply unit. The innovative technology enables the formation of a liquid film on the substrate's surface, which is critical in multiple manufacturing processes. The patent details a controller programmed to manage the supply of inert gas while rotating the substrate, allowing for the creation of openings in the liquid film for improved processing capabilities.
Career Highlights: Tomomasa Ishida has been an essential part of Screen Holdings Co., Ltd., where he has utilized his expertise to advance substrate processing technologies. His dedication and innovative thinking have set a standard in the industry, enabling more efficient processing methods that benefit various applications.
Collaborations: Throughout his career, Ishida has worked alongside talented colleagues, including Hiroaki Takahashi and Kazunori Fujikawa. Their collaborations have fostered an environment of innovation and shared knowledge, driving substantial advancements in substrate processing technologies.
Conclusion: Tomomasa Ishida's contributions to the field of substrate processing reflect his commitment to innovation and excellence. His patent for a substrate processing apparatus showcases his ability to address complex challenges and improve manufacturing processes. Through collaboration and a strong vision for the future, Ishida continues to influence the industry positively.