Screen Holdings Co., Ltd.

Tomomasa Ishida

Ayumi Higuchi

Hiroaki Takahashi

Naozumi Fujiwara

Tomonori Kojimaru

Shota Iwahata

Kazunori Fujikawa

Kana Komori

The controller is programmed to cause a low-surface-tension liquid supply unit to supply a liquid film of a low-surface-tension liquid to a front surface of a substrate so as to form a liquid film of the low-surface-tension liquid. The controller is programmed to control the substrate rotating unit and the inert gas supply unit so that an inert gas is supplied toward the rotational center position while rotating the substrate, thereby forming an opening spreading from the rotational center position to be formed in the liquid film, and enlarging the opening in a direction away from the rotational center position, and to control the landing-position changing unit to change the landing position of the low-surface-tension liquid to at least two positions except the rotational center position in accordance with enlargement of the opening so that the landing position is placed outside the peripheral edge of the opening.

Substrate processing apparatus and substrate processing method

Growing community of inventors

Kyoto, Japan

Tomomasa Ishida