The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2020

Filed:

Dec. 22, 2016
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Hiroaki Takahashi, Kyoto, JP;

Kazunori Fujikawa, Kyoto, JP;

Tomonori Kojimaru, Kyoto, JP;

Tomomasa Ishida, Kyoto, JP;

Ayumi Higuchi, Kyoto, JP;

Naozumi Fujiwara, Kyoto, JP;

Kana Komori, Kyoto, JP;

Shota Iwahata, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/30604 (2013.01); H01L 21/324 (2013.01); H01L 21/6708 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/68792 (2013.01);
Abstract

The controller is programmed to cause a low-surface-tension liquid supply unit to supply a liquid film of a low-surface-tension liquid to a front surface of a substrate so as to form a liquid film of the low-surface-tension liquid. The controller is programmed to control the substrate rotating unit and the inert gas supply unit so that an inert gas is supplied toward the rotational center position while rotating the substrate, thereby forming an opening spreading from the rotational center position to be formed in the liquid film, and enlarging the opening in a direction away from the rotational center position, and to control the landing-position changing unit to change the landing position of the low-surface-tension liquid to at least two positions except the rotational center position in accordance with enlargement of the opening so that the landing position is placed outside the peripheral edge of the opening.


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