Tomoko Jomura

Title: Tomoko Jomura: Innovator in Substrate Technology

Introduction

Tomoko Jomura is a prominent inventor based in Chiba, Japan. She has made significant contributions to the field of substrate technology, particularly in the area of non-specific adsorption restraint. With a total of two patents to her name, her work has implications for various applications in analytical chemistry and biosensing.

Latest Patents

Tomoko Jomura's latest patents focus on innovative methods to inhibit non-specific adsorption on substrate surfaces. The first patent describes a substrate surface that is treated with a liquid containing uncrosslinked polymer based on polyethylene glycol chain segments. This treatment can occur either simultaneously with the immobilization of a substance to detect an analyte or after the analyte has been immobilized. The result is a significant reduction in non-specific adsorption of impurity proteins present in assay samples. The second patent mirrors this approach, emphasizing the effectiveness of the treatment in creating a reliable substrate for analytical applications.

Career Highlights

Tomoko Jomura is currently employed at JSR Corporation, where she continues to advance her research and development efforts. Her work has garnered attention for its practical applications in improving the accuracy and reliability of assays in various scientific fields.

Collaborations

Tomoko collaborates with notable colleagues, including Yukio Nagasaki and Tadahito Takahashi. Their combined expertise contributes to the innovative projects at JSR Corporation.

Conclusion

Tomoko Jomura's contributions to substrate technology highlight her role as a leading inventor in her field. Her patents reflect a commitment to enhancing analytical methods through innovative solutions.