This inventor holds 4 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Mitsui Chemicals, Inc.. Active years: 2012-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2013
Title: Tomokazu Ishizuka: Innovator in Polishing and Thermosensitive Materials
Introduction
Tomokazu Ishizuka is a notable inventor based in Ichihara, Japan. He has made significant contributions to the fields of polishing slurries and thermosensitive recording materials. With a total of 4 patents to his name, Ishizuka continues to push the boundaries of innovation in his industry.
Latest Patents
Ishizuka's latest patents include a polishing slurry designed to minimize damage to underlying layers while maintaining an adequate polishing rate. This innovative slurry contains a resin with an amide group and an organic resin. Another significant invention is a thermosensitive recording material that is less prone to flex cracking and offers high scratch resistance. This material features a base, a thermosensitive recording layer, and a protective layer made from a mixture of hydrophobic and hydrophilic polymers, along with a non-crosslinking urea compound.
Career Highlights
Ishizuka is currently employed at Mitsui Chemicals, Inc., where he applies his expertise in material science to develop cutting-edge products. His work has been instrumental in enhancing the performance and durability of various materials used in technology.
Collaborations
Throughout his career, Ishizuka has collaborated with talented coworkers, including Akinori Etoh and Setsuko Oike. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Tomokazu Ishizuka is a prominent figure in the field of material innovation, with a focus on polishing and thermosensitive materials. His contributions continue to impact the industry positively, showcasing the importance of research and development in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile