Tomohisa Maruyama

Title: Innovations of Tomohisa Maruyama

Introduction

Tomohisa Maruyama is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of technology, particularly in the area of tungsten film formation. With a total of 2 patents to his name, Maruyama continues to push the boundaries of innovation.

Latest Patents

Maruyama's latest patents include a tungsten film forming method and a storage medium. The tungsten film forming method involves creating a tungsten film on a target substrate within a chamber maintained under a depressurized atmosphere. This process utilizes tungsten chloride gas as a raw material, along with a reducing gas to facilitate the reaction. The method includes an SiH gas treatment for the substrate and a sequential supply of tungsten chloride gas and reducing gas, ensuring effective film formation. Another patent focuses on an atomic layer deposition (ALD) method for tungsten film formation, which alternates the supply of tungsten chloride gas and reduction gas while maintaining a purging process within the chamber.

Career Highlights

Tomohisa Maruyama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies related to film deposition processes.

Collaborations

Maruyama has collaborated with notable coworkers such as Takanobu Hotta and Kensaku Narushima, contributing to various innovative projects within the company.

Conclusion

Tomohisa Maruyama's contributions to tungsten film formation technology highlight his role as a significant inventor in the field. His patents reflect a commitment to advancing technological processes, making him a valuable asset to the industry.