Osaka, Japan

Tomohiro Tanaka

USPTO Granted Patents = 3 


Average Co-Inventor Count = 7.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016-2024

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3 patents (USPTO):Explore Patents

Title: Tomohiro Tanaka: Innovator in Radio Wave Absorbing Materials

Introduction

Tomohiro Tanaka is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of radio wave absorbing materials, holding a total of 3 patents. His work focuses on developing advanced materials that enhance the performance of electronic devices.

Latest Patents

Tanaka's latest patents include innovative solutions such as a radio wave absorbing material and a radio wave absorbing sheet. The radio wave absorbing material comprises a fluoropolymer that contains a vinylidene fluoride unit, designed to absorb radio waves within a frequency range of 1 MHz to 100 MHz. Additionally, he has developed a film characterized by a dielectric dissipation factor at a frequency of 1 kHz and 160° C. of 0.02% or lower, along with a dielectric breakdown strength at 160° C. of 400 V/μm or higher. This film includes at least one fluoropolymer selected from a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer and a tetrafluoroethylene/hexafluoropropylene copolymer, with the fluoropolymer exhibiting a crystallinity of 65% or higher.

Career Highlights

Throughout his career, Tanaka has worked with prominent companies such as Daikin Industries, Ltd. and Hitachi Zosen Corporation. His experience in these organizations has allowed him to refine his expertise in material science and innovation.

Collaborations

Tanaka has collaborated with notable colleagues, including Takeshi Hazama and Nobuyuki Komatsu. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Tomohiro Tanaka's contributions to the field of radio wave absorbing materials highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving electronic device performance through advanced materials.

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