Kasugai, Japan

Tomohiro Sakazaki


Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Kasugai, JP (1998 - 2001)
  • Tokyo, JP (2002 - 2013)

Company Filing History:


Years Active: 1998-2013

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5 patents (USPTO):Explore Patents

Title: The Innovations of Tomohiro Sakazaki

Introduction

Tomohiro Sakazaki is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of electron beam lithography, holding a total of 5 patents. His work has advanced the technology used in semiconductor manufacturing and other applications.

Latest Patents

Sakazaki's latest patents include an electron beam lithography apparatus and an electron beam lithography method. The electron beam lithography apparatus features a storage system for data on drawing patterns, which are assigned ranks based on the accuracy required for device patterns. It includes a drawing pattern adjustment unit that generates data on divided drawing patterns according to these ranks. Additionally, a settlement wait time adjustment unit determines the necessary wait time based on the rank, allowing for precise control during the drawing process.

Another significant patent is the multicolumn charged-particle beam lithography system. This system simplifies the circuitry of the settlement wait time control unit, which manages the wait time for amplifiers connected to main deflectors. This innovation enables concurrent exposure among multiple columns, enhancing the efficiency of the patterning process.

Career Highlights

Throughout his career, Tomohiro Sakazaki has worked with prominent companies such as Fujitsu Corporation and Advantest Corporation. His experience in these organizations has contributed to his expertise in lithography technologies and semiconductor manufacturing processes.

Collaborations

Sakazaki has collaborated with notable colleagues, including Hiroshi Yasuda and Masami Takigawa. These partnerships have likely fostered innovation and the exchange of ideas in their respective fields.

Conclusion

Tomohiro Sakazaki's contributions to electron beam lithography and his innovative patents have significantly impacted the technology landscape. His work continues to influence advancements in semiconductor manufacturing and related industries.

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