Otsu, Japan

Tomohiro Nishimura

This inventor holds 1 USPTO granted patent. Top assignee: Omron Corporation. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Tomohiro Nishimura: Innovator in Interrogation Technology

Introduction

Tomohiro Nishimura is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of interrogation technology, particularly through his innovative patent.

Latest Patents

Nishimura holds a patent for an interrogation device, system including an interrogation device, and program. This invention features a controller that performs an integration process for each RF tag passing through a defined interrogation zone. The controller integrates the strength of the reception signal from the RF tag, ensuring that the calculated integral value for each reception signal is larger than that of the preceding signal. When an RF tag reaches a predetermined position, the controller transmits the identifier of the RF tag with the maximum integral value to a host device. This technology enhances the efficiency and accuracy of interrogation processes.

Career Highlights

Tomohiro Nishimura is associated with Omron Corporation, a leading company in automation and control technology. His work at Omron has allowed him to develop and refine his innovative ideas, contributing to advancements in interrogation systems.

Collaborations

Nishimura has collaborated with notable colleagues, including Hidekatsu Nogami and Yoshimitsu Nakano. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Tomohiro Nishimura's contributions to interrogation technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work at Omron Corporation and collaborations with esteemed colleagues further highlight his impact on technology.

Profile summary based on public USPTO records.
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