Tochigi, Japan

Tomohiro Nakamura

This inventor holds 1 USPTO granted patent. Top assignee: Nuflare Technology, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Nakamura. Retrieved from https://idiyas.com/inventor/tomohiro-nakamura-cnb975r6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Tomohiro Nakamura: Innovator in Optical Technology

Introduction

Tomohiro Nakamura is a notable inventor based in Tochigi, Japan. He has made significant contributions to the field of optical technology, particularly with his innovative designs that enhance light manipulation.

Latest Patents

Nakamura holds a patent for a "Luminous flux branching element and mask defect inspection apparatus." This invention features a transparent base member that is arranged diagonally to an optical axis. It includes an incidence plane and an emission plane that are parallel to each other. The design allows incident light from the incidence plane to be split into a main luminous flux and a branched luminous flux, optimizing light distribution for various applications.

Career Highlights

Nakamura is currently employed at Nuflare Technology, Inc., where he continues to develop cutting-edge optical technologies. His work has been instrumental in advancing the capabilities of light inspection systems, which are crucial in various industries.

Collaborations

Throughout his career, Nakamura has collaborated with talented individuals such as Riki Ogawa and Hiroyuki Nagahama. These partnerships have fostered innovation and have led to the successful development of new technologies.

Conclusion

Tomohiro Nakamura's contributions to optical technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in light manipulation and inspection systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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