Nagano, Japan

Tomohiro Inoue

This inventor holds 1 USPTO granted patent. Top assignee: Shinko Electric Industries Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Inoue. Retrieved from https://idiyas.com/inventor/tomohiro-inoue-qnb1bsxf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Tomohiro Inoue: Innovator in Electrostatic Technology

Introduction

Tomohiro Inoue is a notable inventor based in Nagano, Japan. He has made significant contributions to the field of electrostatic technology, particularly through his innovative designs and patents. His work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Inoue holds a patent for an electrostatic chuck and substrate holding device. This invention features a base with a surface designed for placing objects, along with a through hole that extends through the base. A porous material containing angular ceramic particles is strategically disposed within this through hole, enhancing the device's functionality.

Career Highlights

Inoue is associated with Shinko Electric Industries Co., Ltd., a company known for its advancements in electronic components and systems. His role at the company has allowed him to focus on developing innovative solutions that address industry challenges.

Collaborations

Inoue has worked alongside talented colleagues, including Masakuni Miyazawa and Mizuki Watanabe. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Tomohiro Inoue's contributions to electrostatic technology exemplify the impact of innovation in modern industries. His patent for the electrostatic chuck and substrate holding device showcases his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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