This inventor holds 2 USPTO granted patents. Top assignee: Asm IP Holding B.v.. Active years: 2020-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020-2024
Title: Tomohiro Arakawa: Innovator in Plasma Treatment Technology
Introduction
Tomohiro Arakawa is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of plasma treatment technology, holding a total of 2 patents. His work focuses on enhancing substrate processing methods and plasma generation apparatuses.
Latest Patents
Arakawa's latest patents include a plasma treatment device featuring a matching box. This device comprises an RF generator, a matching box with an input terminal, a sensor for sensing high-frequency electricity, an impedance adjustment circuit, and an output terminal. Additionally, it includes a matching controller that regulates the impedance adjustment circuit, a reactor chamber, and a harmonic filter circuit connected to a transmission line between the sensor and the reactor chamber. Another significant patent is a substrate processing method that involves supplying RF power from an RF power supply equipped with a linear amplifier to a plasma generation apparatus via an electronic matcher. This method generates plasma and initiates a process on a substrate, stopping the RF power supply after a prescribed time elapses post plasma generation.
Career Highlights
Tomohiro Arakawa is currently associated with Asm IP Holding B.V., where he continues to innovate in the field of plasma technology. His expertise and inventions have contributed to advancements in substrate processing techniques.
Collaborations
Arakawa collaborates with Koji Tanaka, working together to push the boundaries of plasma treatment technology.
Conclusion
Tomohiro Arakawa's contributions to plasma treatment technology and substrate processing methods highlight his role as an influential inventor in the field. His patents reflect a commitment to innovation and advancement in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile