Mitaka, Japan

Tomohiro Aoto

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Nagoya University, Osaka University, Tokyo Seimitsu Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomohiro Aoto. Retrieved from https://idiyas.com/inventor/tomohiro-aoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Tomohiro Aoto - Innovator in Dimension Measurement Technology

Introduction

Tomohiro Aoto is a notable inventor based in Mitaka, Japan. He has made significant contributions to the field of dimension measurement technology. His innovative approach has led to the development of a unique dimension measuring apparatus.

Latest Patents

Aoto holds a patent for a dimension measuring apparatus. This apparatus includes a light beam splitting element that divides light emitted from a white light source into measuring and reference light fluxes. It features reference light scanning optics that vary the optical path length of the reference light flux. A detector is included to identify the interference signal produced by the light fluxes. The controller determines the surface height of an object based on the optical path length of the reference light flux corresponding to the maximum value of the interference signal.

Career Highlights

Throughout his career, Aoto has worked with prestigious institutions such as Osaka University and Nagoya University. His work has been instrumental in advancing measurement technologies.

Collaborations

Some of his notable coworkers include Norihiko Nishizawa and Masatoshi Arai. Their collaborative efforts have contributed to the success of various projects in the field.

Conclusion

Tomohiro Aoto's innovative contributions to dimension measurement technology highlight his expertise and dedication to advancing this field. His patent and collaborations reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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