Company Filing History:
4 out of 2,874 
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1 out of 2 Years Active: 2011-2013
Title: Innovations of Tomofumi Nishiura
Introduction
Tomofumi Nishiura is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of charged particle beam devices and semiconductor inspection technologies. With a total of six patents to his name, Nishiura's work has advanced the precision and reliability of measurements in these critical areas.
Latest Patents
One of Nishiura's latest patents is a charged particle beam device designed to prevent degradation of measurement reproducibility caused by an increase in beam diameter due to image shift. This device enables accurate measurement of pattern dimensions on a specimen by detecting secondary charged particles emitted when scanned with a primary charged particle beam. A lookup table is utilized to correct for variations in beam diameter, ensuring consistent measurement results.
Another significant patent is a method and apparatus for inspecting defects in circuit patterns formed on semiconductor devices. This invention includes a defect classifier that creates multiple comparison shapes based on design data and SEM images. By comparing these shapes, the apparatus classifies defects effectively, enhancing the quality control processes in semiconductor manufacturing.
Career Highlights
Nishiura has worked with prominent companies such as Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the semiconductor and measurement industries.
Collaborations
Some of Nishiura's notable coworkers include Atsushi Miyamoto and Chie Shishido. Their collaborative efforts have likely played a role in the successful development of his patented technologies.
Conclusion
Tomofumi Nishiura's contributions to the field of charged particle beam devices and semiconductor inspection are noteworthy. His innovative patents reflect a commitment to enhancing measurement accuracy and defect detection in critical technological applications.
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