Osaka, Japan

Tomo Otsuka

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Daikin Industries, Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomo Otsuka. Retrieved from https://idiyas.com/inventor/tomo-otsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

**Title: Tomo Otsuka: Pioneering Innovation in Chemical Manufacturing**

Introduction: Tomo Otsuka, a talented inventor based in Osaka, Japan, has made significant contributions to the field of chemical manufacturing with his groundbreaking patented method for producing 1-halo-2-fluoroethylene.

Latest Patents: Tomo Otsuka holds a single patent for his innovative method for efficiently obtaining trans-1-halo-2-fluoroethylene and/or cis-1-halo-2-fluoroethylene. This process involves isomerization between the E-isomer and Z-isomer in a liquid phase through light irradiation in the presence of a photosensitizer.

Career Highlights: Tomo Otsuka is a valued member of Daikin Industries, Ltd., a prominent company in the chemical industry known for its cutting-edge technology and research. His dedication to advancing chemical manufacturing processes has led to the development of new and efficient methods that have the potential to revolutionize the industry.

Collaborations: Working alongside her colleagues Tsubasa Nakaue and Kazuhiro Takahashi, Tomo Otsuka has fostered a collaborative environment that encourages creativity and innovation. Their combined expertise and teamwork have played a crucial role in the success of the patented method for manufacturing 1-halo-2-fluoroethylene.

Conclusion: Tomo Otsuka's inventive spirit and commitment to excellence have had a profound impact on the field of chemical manufacturing. Her groundbreaking method stands as a testament to her ingenuity and dedication to pushing the boundaries of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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